메뉴 건너뛰기




Volumn 41, Issue 6, 1994, Pages 2443-2451

The Surface Generation Hump in Irradiated Power MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CARRIER CONCENTRATION; CHARGE CARRIERS; GATES (TRANSISTOR); INTERFACES (MATERIALS); RADIATION EFFECTS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DIODES;

EID: 0028721239     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.340600     Document Type: Article
Times cited : (13)

References (15)
  • 2
    • 49949136852 scopus 로고
    • Surface Effects on p-n Junctions: Characteristics of Surface Space-Charge Regions under Non-Equilibrium Conditions
    • A. S. Grove and D. J. Fitzgerald, “Surface Effects on p-n Junctions: Characteristics of Surface Space-Charge Regions under Non-Equilibrium Conditions,” Sol. St. Electr., vol. 9, pp. 783–806, 1966.
    • (1966) Sol. St. Electr , vol.9 , pp. 783-806
    • Grove, A.S.1    Fitzgerald, D.J.2
  • 3
    • 0000617308 scopus 로고
    • Surface Recombination in Semiconductors
    • D. J. Fitzgerald and A. S. Grove, “Surface Recombination in Semiconductors,” Surf Sci., vol. 9, pp. 347–369, 1968.
    • (1968) Surf Sci , vol.9 , pp. 347-369
    • Fitzgerald, D.J.1    Grove, A.S.2
  • 4
    • 0016345841 scopus 로고
    • The Gate-Controlled Diode so Measurement and Steady-State Lateral Current Flow in Deeply Depleted MOS Structures
    • R. F. Pierret, “The Gate-Controlled Diode s o Measurement and Steady-State Lateral Current Flow in Deeply Depleted MOS Structures,” Sol. St. Electr., vol. 17, pp. 1257–1269, 1974.
    • (1974) Sol. St. Electr , vol.17 , pp. 1257-1269
    • Pierret, R.F.1
  • 5
    • 0022600166 scopus 로고
    • Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Oxide Charge in Metal-Oxide-Semiconductor Transistors
    • P. J. McWhorter and P. S. Winokur, “Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Oxide Charge in Metal-Oxide-Semiconductor Transistors,” Appl. Phys. Lett., vol. 48, no. 2, pp. 133–135, 1986.
    • (1986) Appl. Phys. Lett , vol.48 , Issue.2 , pp. 133-135
    • McWhorter, P.J.1    Winokur, P.S.2
  • 6
    • 33748621800 scopus 로고
    • Statistics of the Recombinations of Holes and Electrons
    • W. Shockley and W. T. Read, “Statistics of the Recombinations of Holes and Electrons,” Phys. Rev., vol. 87, no. 5, pp. 835–842, 1952.
    • (1952) Phys. Rev. , vol.87 , Issue.5 , pp. 835-842
    • Shockley, W.1    Read, W.T.2
  • 12
    • 0001480812 scopus 로고
    • Trapped-Hole Annealing and Electron Trapping in Metal-Oxide-Semiconductor Oxide-Semiconductor Devices
    • D. M. Fleetwood, R. A. Reber, Jr., and P. S. Winokur, “Trapped-Hole Annealing and Electron Trapping in Metal-Oxide-Semiconductor Oxide-Semiconductor Devices,” Appl. Phys. Lett., vol. 60, pp. 2008–2010, 1992.
    • (1992) Appl. Phys. Lett. , vol.60 , pp. 2008-2010
    • Fleetwood, D.M.1    Reber, R.A.2    Winokur, P.S.3
  • 13
    • 0025682742 scopus 로고
    • Post Irradiation Behavior of the Interface State Density and the Trapped Positive Charge
    • R. E. Stahlbush and B. J. Mrstik, “Post Irradiation Behavior of the Interface State Density and the Trapped Positive Charge,” IEEE Trans. Nucl. Sci., vol. 37, no. 6, pp. 1641–1649, 1990.
    • (1990) IEEE Trans. Nucl. Sci , vol.37 , Issue.6 , pp. 1641-1649
    • Stahlbush, R.E.1    Mrstik, B.J.2
  • 14
    • 0024169717 scopus 로고
    • Annealing of Total Dose Damage: Redistribution of Interface State Density on <100=, <110=, and <111= Orientation Silicon
    • R. E. Stahlbush, R. K. Lawrence, H. L. Hughes, and N. S. Saks, “Annealing of Total Dose Damage: Redistribution of Interface State Density on <100=, <110=, and <111= Orientation Silicon,” IEEE Trans. Nucl. Sci., vol. 35, no. 6, pp. 1192–1196, 1988.
    • (1988) IEEE Trans. Nucl. Sci , vol.35 , Issue.6 , pp. 1192-1196
    • Stahlbush, R.E.1    Lawrence, R.K.2    Hughes, H.L.3    Saks, N.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.