Study of NiO/Ni(100) structural changes under the influence of ion irradiation at different temperatures

Surface Science

Volumn 321, Issue 3, 1994, Pages 229-236

  Kubiak, R ^a   Morgner, H ^a   Rakhovskaya, O ^a  

^a UNIVERSITY OF WITTEN HERDECKE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LOW ENERGY ELECTRON DIFFRACTION; NICKEL; NICKEL COMPOUNDS; RADIATION EFFECTS; SURFACE PROPERTIES; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION IRRADIATION;

SURFACES;

EID: 0028715192     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(94)90188-0     Document Type: Article

References (19)

1. The structure of thin NiO(100) films grown on Ni(100) as determined by low-energy-electron diffraction and scanning tunneling microscopy
2. XPS characterization of Ni and Mo oxides before and after “in situ” treatments
3. Editorial
4. Electron-stimulated processes at solid surfaces