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Volumn 41, Issue 6, 1994, Pages 2567-2573

Comparison of Hot-Carrier and Radiation Induced Increases in Base Current in Bipolar Transistors1

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CORRELATION METHODS; ELECTRIC CURRENT MEASUREMENT; FAILURE ANALYSIS; GAIN MEASUREMENT; HOT CARRIERS; IONIZATION OF SOLIDS; LINEAR INTEGRATED CIRCUITS; MATHEMATICAL MODELS; RADIATION EFFECTS; STRESS ANALYSIS; VOLTAGE MEASUREMENT;

EID: 0028712012     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.340617     Document Type: Article
Times cited : (6)

References (16)
  • 2
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    • Dependence of Total Dose Response of Commercial Bipolar Linear Microcircuits on Applied Dose Rate
    • S. McClure, R. L. Pease, W. Will, and G. Perry, “Dependence of Total Dose Response of Commercial Bipolar Linear Microcircuits on Applied Dose Rate,” to be presented at the 1994 NSREC.
    • (1994) to be presented at the 1994 NSREC
    • McClure, S.1    Pease, R.L.2    Will, W.3    Perry, G.4
  • 3
    • 0023604280 scopus 로고
    • Poly Emitter Bipolar Hot-Carrier Effects in an Advanced BiCMOS Technology
    • S. P. Joshi, R. Lahri, and C. Lage, “Poly Emitter Bipolar Hot-Carrier Effects in an Advanced BiCMOS Technology,” IEDM Tech. Digest, pp. 182–185, 1987.
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    • Joshi, S.P.1    Lahri, R.2    Lage, C.3
  • 4
    • 0024123241 scopus 로고
    • Modeling Hot-Carrier Effects in Polysilicon Emitter Bipolar Transistors
    • J. D. Burnett and C. Hu, “Modeling Hot-Carrier Effects in Polysilicon Emitter Bipolar Transistors,” IEEE Trans. Electr. Dev., vol. 35, pp. 2238–2244, 1988.
    • (1988) IEEE Trans. Electr. Dev , vol.35 , pp. 2238-2244
    • Burnett, J.D.1    Hu, C.2
  • 5
    • 0018111401 scopus 로고
    • Hardness Assurance Considerations for Long-Term Ionizing Radiation Effects on Bipolar Structures
    • A. R. Hart, J. B. Smyth, Jr., V. A. J. van Lint, D. P. Snowden, and R. E. Leadon, “Hardness Assurance Considerations for Long-Term Ionizing Radiation Effects on Bipolar Structures,” IEEE Trans. Nucl. Sci., vol. NS25, pp. 1502–1507, 1507, 1978.
    • (1978) IEEE Trans. Nucl. Sci , vol.NS25 , pp. 1502-1507
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  • 7
    • 84939758992 scopus 로고
    • Trends in Total-Dose Response of Modern Bipolar Transistors
    • R. N. Nowlin, E. W. Enlow, R. D. Schrimpf, and W. E. Combs, “Trends in Total-Dose Response of Modern Bipolar Transistors,” IEEE Trans. Nucl. Sci., vol. 39, pp. 2026–2035, 2035, 1992.
    • (1992) IEEE Trans. Nucl. Sci , vol.39 , pp. 2026-2035
    • Nowlin, R.N.1    Enlow, E.N.2    Schrimpf, R.D.3    Combs, W.E.4
  • 8
    • 0022188814 scopus 로고
    • Correlation of Hot-Carrier and Radiation Effects in MOS Transistors
    • J. D. McBrayer, D. M. Fleetwood, R. A. Pastorek, and R. V. Jones, “Correlation of Hot-Carrier and Radiation Effects in MOS Transistors,” IEEE Trans. Nucl. Sci., vol. 32, no. 6, pp. 3935–3939, 1985.
    • (1985) IEEE Trans. Nucl. Sci , vol.32 , Issue.6 , pp. 3935-3939
    • McBrayer, J.D.1    Fleetwood, D.M.2    Pastorek, R.A.3    Jones, R.V.4
  • 9
    • 0026368944 scopus 로고
    • Correlation Between Channel Hot-Electron Degradation and Radiation-Induced Interface Tapping in N-channel LDD Devices
    • D. H. Huang, E. E. King, J. J. Wang, R. Ormond, and L. J. Palkuti, “Correlation Between Channel Hot-Electron Degradation and Radiation-Induced Interface Tapping in N-channel LDD Devices,” IEEE Trans. Nucl. Sci., vol. 38, no. 6, pp. 1336–1341, 1991.
    • (1991) IEEE Trans. Nucl. Sci , vol.38 , Issue.6 , pp. 1336-1341
    • Huang, D.H.1    King, E.E.2    Wang, J.J.3    Ormond, R.4    Palkuti, L.J.5
  • 10
    • 84954088989 scopus 로고
    • Use of Electron Beam Irradiation to Study Performance Degradation of Bipolar Transistors After Reverse-Bias Stress
    • K. A. Jenkins, J. D. Cressler, and J. D. Warnock, “Use of Electron Beam Irradiation to Study Performance Degradation of Bipolar Transistors After Reverse-Bias Stress,” in IEEE IEDM Tech. Digest, pp. 873–876, 1991.
    • (1991) IEEE IEDM Tech. Digest , pp. 873-876
    • Jenkins, K.A.1    Cressler, J.D.2    Warnock, J.D.3
  • 12
    • 0027831981 scopus 로고
    • Effects of Oxide Charge and Surface Recombination Velocity on the Excess Base Current of BJTs
    • S. L. Kosier, R. D. Schrimpf, A. Wei, M. DeLaus, D. M. Fleetwood, and W. E. Combs, “Effects of Oxide Charge and Surface Recombination Velocity on the Excess Base Current of BJTs,” in IEEE BCTM Tech. Digest, pp. 211–214, 214, 1993.
    • (1993) IEEE BCTM Tech. Digest , vol.214 , pp. 211-214
    • Kosier, S.L.1    Schrimpf, R.D.2    Wei, A.3    DeLaus, M.4    Fleetwood, D.M.5    Combs, W.E.6
  • 14
    • 0026853994 scopus 로고
    • Border Traps in MOS Devices
    • D. M. Fleetwood, “Border Traps in MOS Devices,” IEEE Trans. Nucl. Sci., vol. 39, pp. 269-271, 1992.
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    • Fleetwood, D.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.