Dependence of Total Dose Response of Bipolar Linear Microcircuits on Applied Dose Rate

IEEE Transactions on Nuclear Science

Volumn 41, Issue 6, 1994, Pages 2544-2549

  McClure, S ^a   Pease, R L ^b   Will, W ^a   Perry, G ^a  

^a BOEING COMPANY   (United States)

^b Quail Run Court ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BIPOLAR SEMICONDUCTOR DEVICES; CMOS INTEGRATED CIRCUITS; ELECTRIC VARIABLES MEASUREMENT; MICROELECTRONICS; RADIATION EFFECTS; SPACE APPLICATIONS; THERMAL EFFECTS;

MICROCIRCUITS; TOTAL DOSE RADIATION HARDNESS;

LINEAR INTEGRATED CIRCUITS;

EID: 0028693849     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.340614     Document Type: Article

References (6)

1. E.W. Enlow, R.L. Pease, W.E. Combs, R.D. Schrimpf, and R.N. Nowlin, “Response of Advanced Bipolar Processes to Ionizing Radiation,” IEEE Transactions on Nuc. Sci., Vol. NS38, pp. 1342–1351, 1991.
2. R.N. Nowlin, D.M. Fleetwood, R.D. Schrimpf, R.L. Pease, and W.E. Combs, “Hardness Assurance and Testing Issues for Bipolar/BiCMOS Devices,” IEEE Transactions on Nuc. Sci., Vol. NS40, pp. 1686-1694, 1993.
3. A. Wei, S.L. Kosier, R.D. Schrimpf, D.M. Fleetwood, and W.E. Combs, “Dose-Rate Effects on BJT Gain Degradation,” submitted to Applied Physics Letters.
4. D.M. Fleetwood, R.A. Reber, Jr., P.S. Winokur, R.N. Nowlin, S.L. Kosier. R.D. Schrimpf, R.L. Pease, and M. DeLaus. “Enhanced Charge Trapping in Bipolar Spacer Oxides during Low-Dose-Rate Irradiations,” to be presented at the 1994 IEEE NSREC.
5. J. Beaucour, T. Carriere, A. Gach, “Total Dose Effects on Negative Voltage Regulator,” to be presented at the 1994 IEEE NSREC.
6. P. J. McWhorter, D. M. Fleetwood, R. A. Pastorek, and G. T. Zimmerman, “Comparison of MOS Capacitor and Transistor Postirradiation Response,” IEEE Trans. on Nuc. Sci. Vol. 36, pp. 1792–1799, 1989.