Large-area growth of pb(zr,ti)o3 thin films by mocvd

Integrated Ferroelectrics

Volumn 5, Issue 1, 1994, Pages 39-45

  Shiosaki, Tadashi ^a   Fujimoto, Masashi ^a   Shimizu, Masaru ^a   Fukagawa, Mitsuru ^b   Nakaya, Kenichi ^b   Tanikawa, Eiki ^b  

^a KYOTO UNIVERSITY   (Japan)

^b Amaya Co Ltd ^*  (Japan)

Author keywords

large area growth; MOCVD; Pb(Zr, Ti)O; thin films

Indexed keywords

FERROELECTRIC MATERIALS; FILM GROWTH; LEAD COMPOUNDS; SPUTTERING; THICKNESS MEASUREMENT; THIN FILMS; TITANIUM DIOXIDE; ZIRCONIA;

LARGE AREA GROWTH; LEAD OXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0028599148     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584589408018678     Document Type: Article

References (4)

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