Chemical mechanical polishing for planarization in manufacturing environment

Materials Research Society Symposium - Proceedings

Volumn 337, Issue , 1994, Pages 99-104

  Desai, Mukesh ^a   Jairath, Rahul ^a   Stell, Matt ^a   Tolles, Robert ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; FILMS; INTEGRATED CIRCUIT MANUFACTURE; PROCESS CONTROL; SILICON; STABILITY; TECHNOLOGY;

CHEMICAL MECHANICAL POLISHING; MANUFACTURABILITY; OXIDE FILMS; PLANARIZATION;

CHEMICAL POLISHING;

EID: 0028581233     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-337-99     Document Type: Conference Paper

References (7)