Ultra-thin film SOI/CMOS with selective-EPI source/drain for low series resistance, high drive current

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1994, Pages 33-34

  Hwang, J M ^a   Wise, R ^a   Yee, E ^a   Houston, T ^a   Pollack, G P ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SILICON ON INSULATOR TECHNOLOGY; THIN FILM DEVICES;

DRIVE CURRENT; SELECTIVE EPITAXIAL SOURCE/DRAIN; SERIES RESISTANCE; SILICIDE;

CMOS INTEGRATED CIRCUITS;

EID: 0028560881     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)