Low threshold voltage vertical-cavity lasers fabricated by selective oxidation

Electronics Letters

Volumn 30, Issue 24, 1994, Pages 2043-2044

  Choquette, K D ^a   Schneider, R P ^a   Lear, K L ^a   Geib, K M ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Oxidation; Vertical cavity surface emitting lasers

Indexed keywords

ELECTRIC CONTACTS; ELECTRIC CURRENTS; FABRICATION; MASKS; MIRRORS; OXIDATION; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM WELLS;

HIGH ENERGY PROTON IMPLANTATION; HYBRID DIELECTRIC DISTRIBUTED BRAGG REFLECTOR; MONOLITHIC DISTRIBUTED BRAGG REFLECTOR MIRROR; SELECTIVE OXIDATION; VERTICAL CAVITY SURFACE EMITTING LASERS;

SEMICONDUCTOR LASERS;

EID: 0028550787     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19941421     Document Type: Article

References (6)

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