Effects of Chemical Etching on the Asymmetric Magnetization Reversal in Amorphous Magnetic Alloy

IEEE Transactions on Magnetics

Volumn 30, Issue 6, 1994, Pages 4791-4793

  Zhou, Peter Y ^c  

^a Korea Institute of Science and Technology   (South Korea)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c Knogo Corp ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYS; ANNEALING; COERCIVE FORCE; ETCHING; FERROMAGNETIC MATERIALS; MAGNETIC DOMAINS; MAGNETIC FIELDS; MAGNETIC HYSTERESIS;

AMORPHOUS FERROMAGNETIC RIBBON; AMORPHOUS MAGNETIC ALLOY; ASYMMETRIC MAGNETIZATION REVERSAL; AUGER DEPTH PROFILE ANALYSIS;

MAGNETIZATION;

EID: 0028550429     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.334223     Document Type: Article

References (3)

1. US Patent 5029291, July 2, 1991; K. H. Shin, Y. Peter Zhou, and C. D. Graham, Jr., IEEE Trans. Magn., MAG-28, 2772 (1992).
2. B. E. Argyle, B. Petek, D. A. Herman, J. Appl. Phys. 55, 4303 (1987)
3. R. Schafer, W. K. Ho, J. Yamasaki, A. Hubert, and F. B. Humphrey, IEEE Trans. Magn., MAG-27, 3678 (1991).