Magnetic properties and micrstructure of sputtered CoSm/X(X=Ti,V,Cu and Cr) thin films

IEEE Transactions on Magnetics

Volumn 30, Issue 6, 1994, Pages 4038-4040

  Morita, H ^c   Suzuki, O ^b   Hosoya, N ^b  

^a KUBOTA CORPORATION   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c YAMAGATA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHROMIUM; COBALT ALLOYS; COERCIVE FORCE; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; MICROSTRUCTURE; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

COERCIVITY; COLUMNAR STRUCTURE; CRYSTALLINE BOUNDARIES; SATURATION MAGNETIZATION; UNDERLAYERS; VIBRATING SAMPLE MAGNETOMETER; X RAY DIFFRACTION;

MAGNETIC THIN FILMS;

EID: 0028548879     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.333982     Document Type: Article

References (3)

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2. E.M.T.Velu and D.N.I.ambeth: IEEE Trans Magn.,28(1992),3249.
3. X.B.Yang and T.Miyazaki: J.Magn.Magn.Mater.,86(1990),37.