Vapor deposition polymerization of N-methylolacrylamide

Thin Solid Films

Volumn 251, Issue 1, 1994, Pages 36-39

  Masao Tamada, ^a   Hideki Omichi, ^a   Norimasa Okui, ^b  

^a TAKASAKI ADVANCED RADIATION RESEARCH INSTITUTE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Fourier transform infrared spectroscopy; Physical vapour deposition; Polymers

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELDS; MOLECULAR WEIGHT; MONOMERS; POLYAMIDES; POLYMERIZATION; SECOND HARMONIC GENERATION;

COEVAPORATION; HYDROQUINONE; N METHYLOLACRYLAMIDE; PHYSICAL VAPOR DEPOSITION; THERMAL CHEMICAL VAPOR DEPOSITION; VAPOR DEPOSITION POLYMERIZATION;

THIN FILMS;

EID: 0028517986     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)90837-0     Document Type: Article

References (12)

1. Preparation of Hybrid Films of Aromatic polyimide by Vapor Deposition Polymerization.
2. Optical Second Harmonic Generation from Poled Thin Films of Aromatic Polyurea Prepared by Vapor Deposition Polymerization
3. Pyroelectricity in Poled Thin Films of Aromatic Polyurea Prepared by Vapor Deposition Polymerization
4. Molecular Orientation and Photocurrent of Alkyl-Aromatic Polyimide Films Prepared by Vapor Deposition Polymerization