Polycrystalline Silicon-Germanium Thin-Film Transistors

IEEE Transactions on Electron Devices

Volumn 41, Issue 9, 1994, Pages 1581-1591

  King, Tsu Jae ^a   Saraswat, Krishna C ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; CRYSTALLINE MATERIALS; CRYSTALLIZATION; ELECTRIC PROPERTIES; IMAGE SENSORS; LIQUID CRYSTAL DISPLAYS; MOSFET DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE;

DEFECT PASSIVATION PROCESSES; LARGE AREA ELECTRONICS APPLICATION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MOS THIN FILM TRANSISTORS; POLYCRYSTALLINE SILICON GERMANIUM FILMS; THERMAL PRINTER HEADS;

THIN FILM TRANSISTORS;

EID: 0028514701     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.310109     Document Type: Article

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