Characteristic change due to polarization fatigue of sol-gel ferroelectric Pb(Zr0.4Ti0.6)O3 thin-film capacitors

Japanese Journal of Applied Physics

Volumn 33, Issue 9 S, 1994, Pages 5281-5286

  Mihara, Takashi ^a   Watanabe, Hitoshi ^a   De Araujo, Carlos A Paz ^b  

^a OLYMPUS CORPORATION   (Japan)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

Bipolar pulses; Domain motion; Fatigue; Fatigue model; Ferroelectrics; Hysteresis loops; Leakage current; Oxygen vacancy; PZT; Thin film

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRIC FIELD EFFECTS; ELECTRIC PROPERTIES; ELECTROMAGNETIC WAVE POLARIZATION; FATIGUE OF MATERIALS; FERROELECTRIC DEVICES; HYSTERESIS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; PERMITTIVITY; SEMICONDUCTING FILMS; SOL-GELS;

DOMAIN MOTION; LEAD ZIRCONATE TITANATE (PZT); OXYGEN VACANCIES; POLARIZATION SWITCHING; TIME ZERO CURRENT VOLTAGE CHARACTERISTICS;

CAPACITORS;

EID: 0028513152     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.5281     Document Type: Article

References (26)

1. J. F. Scott and C. A. Araujo: Science 246 (1989) 1400.
2. H. M. Duiker, P. D. Beal, J. F. Scott, C. A. Araujo, B. M. Melnick, J. D. Cuchiro and L. D. McMillan: J. Appl. Phys. 11 151.
3. T. Mihara, H. Watanabe and C. A. Araujo: Jpn. J. Appl. Phys. 32 (1993) 4168.
4. B. M. Melnick, C. A. P. Araujo, L. D. McMillan, D. A. Carver and J. F. Scott: Ferroelectrics 116 (1991) 79.
5. P. J. Schuele and S. D. Traynor: Abstr. Fifth U.S.-Japan 24 Semin. Dielectric and Piezoelectric Ceramics (1990) p. 286.
6. R. A. Lipeles, B. A. Morgan and M.S. Leung: Proc. 3rd Int. 25 Symp. Integrated Ferroelectrics, Colorado Springs (1991) p. 368. 26
7. I. K. Naik, L. E. Sanchez, S. Y. Wu and B. P. Madreric: Proc. 3rd Int. Symp. Integrated Ferroelectrics, Colorado Springs (1991) p. 431.
8. H. Watanabe, T. Mihara, H. Yoshimoriand C. A. Araujo: Proc. 3rd Int. Symp. Integrated Ferroelectrics, Colorado Springs p. 346.
9. T. Mihara, H. Watanabe, H. Yoshimori, C. A. Araujo, B. M. Melnick and L. D. McMillan: Proc. 3rd Int. Symp. Integrated Ferroelectrics, Colorado Springs (1991) p. 116.
10. T. Mihara, H. Watanabe and C. A. Araujo: to be published in Jpn. J. Appl. Phys. (1994).
11. R. D. Nasby, J. R. Schwank, M. S. Rodgers and S. L. Miller: Proc. 3rd Int. Symp. Integrated Ferroelectrics, Colorado Springs (1991) p. 376.
12. J. F. Bullington, M. D. Ivey and J. T. Evans: Proc. CMC89 (1989) p. 201.
13. J. F. Scott, C. A. Araujo, B. M. Melnick, L. D. McMillan and R. Zuleeg: J. Appl. Phys. 70 (1991) 382.
14. S. B. Sesu and I. K. Yoo: Proc. 4th Int. Symp. Integrated Ferroelectrics, Monterey (1992) p. 640.
15. M. V. Raymond, J. Chen and D. M. Smyth: to be published in Proc. 5th Int. Symp. Integrated Ferroelectrics, Colorado Springs (1993).
16. D. M. Smyth: Ferroelectrics 116 (1991) 117.
17. R. Waser and M. Klee: Proc. 3rd Int. Symp. Integrated Ferroelectrics, Colorado Springs (1991) p. 288.
18. R. Moazzami, C. Hu and W. H. Shepherd: Trans. Electron Devices 39 (1992) 2044.
19. R. Moazzami, C. Hu and W. H. Shepherd: Proc. Int. Reliability Physics Symp. 28 (1990) p. 231.
20. R. Gerson and H. Jaffe: J. Phys. & Chem. Solids 24 (1963) 979
21. C. Sudhama, A. C. Campbell, R. D. Maniar, R. E. Jones, R. Moazzami, C. J. Mogab and J. C. Lee: J. Appl. Phys. 75 (1994) 1014.
22. Y. C. Jeon, H. Y. Lee and S. K. Joo: J. Appl. Phys. 75 (1994) 979.
23. W. Kanzig: Phys. Rev. 98 (1955) 549.
24. L. Wu, C. C. Wei, T. S. Wu and H. C. Lie: J. Phys. C 16 (1983) 2813.
25. L. Wu, C. C. Wei, T. S. Wu and C. C. Teng: J. Phys. C: Solid State Phys. 16 (1983) 2803.
26. N. Bar-Chaim, M. Brunstein, J. Grunberg and A. Seidman: J. Appl. Phys. 45 (1974) 2398.