Step coverage and electrical properties of (Ba, Sr)TiO3 films prepared by liquid source chemical vapor deposition using TiO(DPM)2

Japanese Journal of Applied Physics

Volumn 33, Issue 9 S, 1994, Pages 5129-5134

  Kawahara, Takaaki ^a   Yamamuka, Mikio ^a   Makita, Tetsuro ^a   Naka, Jiro ^b   Yuuki, Akimasa ^a   Mikami, Noboru ^a   Ono, Kouichi ^a  

^a Semiconductor Research Laboratory ^*  (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

BST; Capacitor; CVD; Dielectric constant; Film composition; Leakage current density; Liquid source; LSI; Step coverage

Indexed keywords

BARIUM TITANATE; CAPACITORS; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; FILM PREPARATION; LEAKAGE CURRENTS; LSI CIRCUITS; OPTIMIZATION; PERMITTIVITY; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

LIQUID SOURCE; STEP COVERAGE; STRONTIUM TITANATE;

FERROELECTRIC MATERIALS;

EID: 0028511732     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.5129     Document Type: Article

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