SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 33, Issue 9, 1994, Pages L1304-L1306

Improvement in magnetoresistance of very thin permalloy films by post-annealing

(4) Funaki, Hiroshi a Okamoto, Satoshi a Kitakami, Osamu a Shimada, Yutaka a

a TOHOKU UNIVERSITY (Japan)

Author keywords

Anisotropy field; Coercivity; Magnetoresistance; Permalloy; Sputter beam method

Indexed keywords

ANISOTROPY; ANNEALING; COERCIVE FORCE; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON SCATTERING; FILM PREPARATION; GRAIN GROWTH; MAGNETOELECTRIC EFFECTS; METALLIC FILMS; THERMAL EFFECTS; THIN FILMS;

ANISOTROPY FIELD; MAGNETORESISTANCE; SPUTTER BEAM METHOD; THIN PERMALLOY FILMS;

MAGNETIC FILMS;

EID: 0028508159 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.33.L1304 Document Type: Article

Times cited : (20)

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