Determination of W-Ti/Al thin-film interaction by sheet resistance measurement

Thin Solid Films

Volumn 249, Issue 1, 1994, Pages 6-10

  Wondergem, H J ^a   Heger, A ^b   van den Broek, J J ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANNEALING; DISSOLUTION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; THIN FILMS; TITANIUM ALLOYS; TUNGSTEN ALLOYS;

SHEET RESISTANCE MEASUREMENT; THIN FILM INTERACTION; TUNGSTEN TITANIUM FILMS;

METALLIC FILMS;

EID: 0028495755     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)90077-9     Document Type: Article

References (11)

1. The conductivity of thin metallic films according to the electron theory of metals
2. The mean free path of electrons in metals
3. Resistivity Studies of Single-Crystal and Polycrystal Films of Aluminum