Modelling of radio frequency plasmas in tetrafluoromethane (cf4): The gas phase physics and the role of negative ion detachment

Journal of Physics D: Applied Physics

Volumn 27, Issue 9, 1994, Pages 1878-1886

  Gogolides, Evangelos ^a   Stathakopoulos, M ^a   Boudouvis, A ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DETACHING RADICALS; NEGATIVE ION DETACHMENT; PLASMA ETCHING; RADIOFREQUENCY PLASMAS; TETRAFLUOROMETHANE;

ELECTRIC DISCHARGES; FLUOROCARBONS; FREE RADICALS; IONIZATION; IONS; MATHEMATICAL MODELS; MICROWAVES; PLASMA STABILITY; PRESSURE EFFECTS;

PLASMAS;

EID: 0028494947     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/27/9/011     Document Type: Article

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