Deposition and Properties of Low-Pressure Chemical-Vapor Deposited Polycrystalline Silicon-Germanium Films

Journal of the Electrochemical Society

Volumn 141, Issue 8, 1994, Pages 2235-2241

  King, Tsu Jae ^a   Saraswat, Krishna C ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTALLINE MATERIALS; GRAIN SIZE AND SHAPE; PHASE TRANSITIONS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICA; SILICON ALLOYS; THIN FILM DEVICES; TWINNING;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE SILICON GERMANIUM ALLOY FILMS;

SEMICONDUCTING FILMS;

EID: 0028482908     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2055095     Document Type: Article

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