Ion-assisted laser processing of CNx films

Materials Science and Engineering B

Volumn 26, Issue 1, 1994, Pages 49-53

  Narayan, J ^a   Reddy, J ^a   Biunno, N ^a   Kanetkar, S M ^a   Tiwari, P ^a   Parikh, N ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON INORGANIC COMPOUNDS; CRYSTAL MICROSTRUCTURE; DEPOSITION; HARDNESS; NITRIDES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NITRIDE FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ION ASSISTED PULSED LASER DEPOSITION; ION CURRENTS; NANO INDENTATION HARDNESS MEASUREMENTS; RUTHERFORD BACKSCATTERING CHANNELLING; SUBSTRATE BIAS;

FILM GROWTH;

EID: 0028482577     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(94)90186-4     Document Type: Article

References (9)

1. Growth and characterization of C-N thin films