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Volumn 7, Issue 3, 1994, Pages 369-373

Single-Wafer Cluster Tool Performance: An Analysis of Throughput

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN AIDS; MODIFICATION; PRODUCT DESIGN; SEMICONDUCTOR DEVICE MODELS; SUBSTRATES;

EID: 0028481573     PISSN: 08946507     EISSN: 15582345     Source Type: Journal    
DOI: 10.1109/66.311340     Document Type: Article
Times cited : (186)

References (5)
  • 2
    • 42549099642 scopus 로고
    • Multistep Insitu single wafer processing
    • J. R. Hauser, N. A. Masnari, and M. A. Littlejohn, “Multistep Insitu single wafer processing,” in Proc. MRS, vol. 146, 1989, p. 15.
    • (1989) Proc. MRS , vol.146 , pp. 15.
    • Hauser, J.R.1    Masnari, N.A.2    Littlejohn, M.A.3
  • 4
    • 33747664347 scopus 로고
    • Performance analysis of multiprocessor semiconductor manufacturing equipment and Pool
    • Atherton, Turner, and Pool, “Performance analysis of multiprocessor semiconductor manufacturing equipment,” in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf., 1990, p. 131.
    • (1990) IEEE/SEMI Advanced Semiconductor Manufacturing Conf. , pp. 131.
    • Atherton, T.1
  • 5
    • 84957512687 scopus 로고
    • Cluster processing for 16-Mb production Bergendahl and Horak
    • Bergendahl and Horak, “Cluster processing for 16-Mb production,” in Proc. SPIE, vol. 1188, 1989, p. 86.
    • (1989) Proc. SPIE , vol.1188 , pp. 86.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.