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Volumn 6, Issue 1, 1994, Pages 9-25
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Scaling of MOS technology to submicrometer feature sizes
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Author keywords
[No Author keywords available]
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Indexed keywords
INDUSTRIAL RESEARCH;
INTEGRATED CIRCUIT LAYOUT;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
TECHNOLOGY;
FEATURE SIZE REDUCTION;
MOS TECHNOLOGY;
SCALING;
SUBMICROMETER FEATURE SIZES;
MOS DEVICES;
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EID: 0028466732
PISSN: 09251030
EISSN: 15731979
Source Type: Journal
DOI: 10.1007/BF01250732 Document Type: Article |
Times cited : (36)
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References (34)
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