New Evaluation Method of Resist Coating Using Heterodyne Holographic Wafer Alignment

Japanese Journal of Applied Physics

Volumn 33, Issue 7R, 1994, Pages 3873-

  Yamashita, Kazuhiro ^a   Nomura, Noboru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; HETERODYNING; HOLOGRAPHY; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; SIGNAL TO NOISE RATIO; ULTRAVIOLET RADIATION; VLSI CIRCUITS;

CONVENTIONAL ALIGNMENT SYSTEM; DEEP ULTRAVIOLET RAYS; HETERODYNE HOLOGRAPHIC WAFER ALIGNMENT; NONUNIFORMITY; OVERLAY ACCURACY; OVERLAY ERROR BUDGET; RESIST ALIGNMENT GRATING; RESIST COATING; STEPPER;

COATINGS;

EID: 0028462720     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.3873     Document Type: Article

References (7)

1. D. C. Flanders, H. I. Smith and S. Austin 1977 Appl. Phys. Lett. 31 426.
2. S. Wittekoek and J. van der Werf 1984 Proc. Soc. Photo-Opt. Instrum. Eng. 470 62.
3. N. Magome and N. Shiraishi 1989 Proc. SPIE 1088 238.
4. K. Yamashita, N. Nomura, K. Kubo, Y. Yamada and S. Suzuki 1990 Proc. SPIE 1264 219.
5. N. Nomura and K. Yamashita, Y. Yamada, S. Suzuki and T. Takemoto 1987 Jpn. J. Appl. Phys. 26 959.
6. K. Yamashita and N. Nomura 1990 Ext. Abst. 22th Conf. Solid State Devices and Materials, Sendai, 1990 (Business Center for Academic Societies Japan, Tokyo) p. 845.
7. D. B. La Vegne and D. C. Hofer 1985 Proc. SPIE 539 115.