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Volumn 38, Issue 2, 1994, Pages 105-130

Channeling implants in silicon crystals

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ATOMS; BORON; CRYSTALS; DOSIMETRY; ENERGY DISSIPATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; PHOSPHORUS; RADIATION DAMAGE; SILICON;

EID: 0028461497     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/0254-0584(94)90001-9     Document Type: Review
Times cited : (16)

References (69)
  • 48
    • 84911305136 scopus 로고    scopus 로고
    • V. Privitera, W. Vandervost and T. Clarysse, J. Electrochem. Soc. (in press).
  • 63
    • 84911338242 scopus 로고    scopus 로고
    • K. Klein, C. Park and A. Tasch, 1990 IEDM Tech. Dig. 745.
  • 69
    • 84911290813 scopus 로고    scopus 로고
    • V. Raineri, R.J. Schreutelkamp, F.W. Saris, R.E. Kaim, K.T.F. Janssen, Nucl. Instr. Meth. B59/60 1056.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.