|
Volumn 38, Issue 2, 1994, Pages 105-130
|
Channeling implants in silicon crystals
a a b c c
b
CNR IMETEM
(Italy)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
AMORPHOUS MATERIALS;
ANNEALING;
ATOMS;
BORON;
CRYSTALS;
DOSIMETRY;
ENERGY DISSIPATION;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
PHOSPHORUS;
RADIATION DAMAGE;
SILICON;
CHANNELING IMPLANTS;
CHANNELING TAILS;
ELECTRONIC STOPPING;
ION IMPLANTATION;
|
EID: 0028461497
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/0254-0584(94)90001-9 Document Type: Review |
Times cited : (16)
|
References (69)
|