Electrodeposited defect chemistry superlattices

Science

Volumn 264, Issue 5165, 1994, Pages 1573-1576

  Switzer, Jay A ^a   Hung, Chen Jen ^a   Breyfogle, Bryan E ^a   Shumsky, Mark G ^a   Van Leeuwen, Robert ^a   Golden, Teresa D ^a  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHEMICAL VARIABLES CONTROL; CRYSTAL DEFECTS; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTRON TRANSPORT PROPERTIES; REACTION KINETICS; SUPERCONDUCTING FILMS; SUPERCONDUCTING MATERIALS; SUPERCONDUCTING TRANSITION TEMPERATURE; THALLIUM COMPOUNDS; X RAY ANALYSIS;

BEAKER; CATION INTERSTITIALS; DEFECT CHEMISTRY; ELECTRON TRANSFER REACTION; ELECTRONIC DIMENSIONALITY; EPITAXIAL STRUCTURES; HIGH CARRIER DENSITY; OVERPOTENTIALS; OXYGEN VACANCIES; THALLIUM OXIDE;

SUPERLATTICES;

OXIDE; THALLIUM OXIDE; UNCLASSIFIED DRUG;

ARTICLE; CONDUCTOR; CRYSTAL STRUCTURE; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; FILM; PRIORITY JOURNAL; SCANNING TUNNELING MICROSCOPY; X RAY DIFFRACTION;

EID: 0028452878     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.264.5165.1573     Document Type: Article

References (28)