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Volumn 41, Issue 3, 1994, Pages 565-571

Radiation effects on soi analog devices parameters

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIGITAL CIRCUITS; DOSIMETRY; INTEGRATED CIRCUIT TESTING; LINEAR INTEGRATED CIRCUITS; MICROPROCESSOR CHIPS; NEUTRONS; OPERATIONAL AMPLIFIERS; RADIATION HARDENING; SHIFT REGISTERS; SILICON ON INSULATOR TECHNOLOGY; TRANSISTORS;

EID: 0028448143     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.299800     Document Type: Article
Times cited : (8)

References (20)
  • 3
    • 0001560407 scopus 로고
    • Study of device parameters for analog IC design in a 1.2 µm CMOS-SOI technology after 10 Mrad
    • N°6
    • F.Faccio, E.H.M.Heijne, P.Jarron, M.Glaser, G.Rossi, S.Avrillon and G.Borel “ Study of device parameters for analog IC design in a 1.2 µm CMOS-SOI technology after 10 Mrad.” IEEE Trans. Nucl. Sci., Vol.39, N°6, pp.1739-1746 (1992).
    • (1992) IEEE Trans. Nucl. Sci. , vol.39 , pp. 1739-1746
    • Faccio, F.1    Heijne, E.H.M.2    Jarron, P.3    Glaser, M.4    Rossi, G.5    Avrillon, S.6    Borel, G.7
  • 4
    • 0024173915 scopus 로고
    • The use of multiple oxygen implants for fabrication of bipolar silicon-on-insulator insulator integrated circuits
    • N°6
    • D.G.Platteter and T.F.Cheek, Jr, “The use of multiple oxygen implants for fabrication of bipolar silicon-on-insulator insulator integrated circuits", IEEE Trans. Nucl. Sc., Vol.NS-35, N°6, pp.1350-1354 (1988).
    • (1988) IEEE Trans. Nucl. Sc. , vol.NS-35 , pp. 1350-1354
    • Platteter, D.G.1    Cheek, T.F.2
  • 5
    • 84939758992 scopus 로고
    • Trends in total-dose response of modern bipolar transistors
    • N°6
    • R.N.Nowlin, E.W.Enlow, R.D.Schrimpf and W.E.Combs, “Trends in total-dose response of modern bipolar transistors", IEEE Trans. Nucl. Sci., Vol.39, N°6, pp.2026-2035 (1992).
    • (1992) IEEE Trans. Nucl. Sci. , vol.39 , pp. 2026-2035
    • Nowlin, R.N.1    Enlow, E.W.2    chrimpf, R.D.S.3    Combs, W.E.4
  • 10
    • 0003495751 scopus 로고
    • Ionizing radiation effects in MOS devices and circuits
    • J. Wiley&Sons
    • T.P.Ma and P.V.Dressendorfer, “Ionizing radiation effects in MOS devices and circuits", p262 J.Wiley&Sons (1989).
    • (1989) , pp. 262
    • Ma, T.P.1    Dressendorfer, P.V.2
  • 12
    • 77957022392 scopus 로고
    • An evaluation of low energy X-ray and 60 Co irradiations of MOS transistors
    • C.M.Dozier, D.M.Fleetwood, D.B.Brown and P.S.Winokur, “An evaluation of low energy X-ray and 60 Co irradiations of MOS transistors", WEE Trans. Nucl. Sci., Vol.NS-34, pp.1535-1539 (1987).
    • (1987) WEE Trans. Nucl. Sci. , vol.NS-34 , pp. 1535-1539
    • Dozier, C.M.1    Fleetwood, D.M.2    Brown, D.B.3    Winokur, P.S.4
  • 13
    • 0015604929 scopus 로고
    • Dependence of ionizing radiation induced h FE degradation on emitter periphery
    • R.L.Pease, F.N.Coppage and E.D.Graham, “Dependence of ionizing radiation induced h FE degradation on emitter periphery", IEEE Trans. Nucl. Sci., Vol.NS-21, pp.41-42 (1974).
    • (1974) IEEE Trans. Nucl. Sci. , vol.NS-21 , pp. 41-42
    • Pease, R.L.1    Coppage, F.N.2    Graham, E.D.3
  • 15
    • 84938017128 scopus 로고
    • The effects of neutron irradiation on germanium and silicon
    • G.C.Messenger and J.P.Spratt, “The effects of neutron irradiation on germanium and silicon" Proc. IRE, Vol. 46, (1958).
    • (1958) Proc. IRE , vol.46
    • Messenger, G.C.1    Spratt, J.P.2
  • 16
    • 84939724062 scopus 로고
    • Design curves for predicting fast neutron induced resistivity changes in silicon
    • M.G.Beuhler, “Design curves for predicting fast neutron induced resistivity changes in silicon" Proc. IEEE, 56, (1958).
    • (1958) Proc. IEEE
    • Beuhler, M.G.1
  • 17
    • 0018156739 scopus 로고
    • Hardness assurance guidelines for moderate neutron environment effects in bipolar transistors and integrated circuits
    • N o 6
    • R.A.Berger, J.L.Azarewicz and H.Eisen, “Hardness assurance guidelines for moderate neutron environment effects in bipolar transistors and integrated circuits", IEEE Trans. Nucl. Sci., Vol.NS 25, N o 6, (1978).
    • (1978) IEEE Trans. Nucl. Sci. , vol.NS 25
    • Berger, R.A.1    Azarewicz, J.L.2    Eisen, H.3
  • 18
    • 0020915906 scopus 로고
    • A comparison of radiation damage in linear ICs from Cobalt-60 gamma rays and 2.2 MeV electrons
    • N°6
    • M.K.Gauthier and D.K.Nichols, “A comparison of radiation damage in linear ICs from Cobalt-60 gamma rays and 2.2 MeV electrons" IEEE Trans. Nucl. Sci., Vol.NS-30, N°6, pp.4192-4196 (1983).
    • (1983) IEEE Trans. Nucl. Sci. , vol.NS-30 , pp. 4192-4196
    • Gauthier, M.K.1    Nichols, D.K.2
  • 19
    • 84939750963 scopus 로고
    • A comparison of radiation damage in linear ICs from Cobalt-60 gamma rays and 2.2 MeV electrons
    • M.K.Gauthier and D.K.Nichols, “A comparison of radiation damage in linear ICs from Cobalt-60 gamma rays and 2.2 MeV electrons" Final report, JPL, (September 1983).
    • (1983) Final report
    • Gauthier, M.K.1    Nichols, D.K.2
  • 20
    • 72349094974 scopus 로고
    • Models for total dose degradation of linear integrated circuits
    • N°6
    • A.H.Johnston and R.E.Plaag, “Models for total dose degradation of linear integrated circuits" IEEE Trans. Nucl. Sci., Vol.NS-34, N°6, pp.1474-1480 (1987).
    • (1987) IEEE Trans. Nucl. Sci. , vol.NS-34 , pp. 1474-1480
    • Johnston, A.H.1    Plaag, R.E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.