A kinetics and transport model of dichlorosilane chemical vapor deposition

Journal of Crystal Growth

Volumn 140, Issue 1-2, 1994, Pages 191-204

  Knutson, K L ^a   Carr, R W ^a   Liu, W H ^a   Campbell, S A ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; COMPUTATIONAL METHODS; DECOMPOSITION; DISSOCIATION; FLUID DYNAMICS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SENSITIVITY ANALYSIS; SILANES; SURFACES;

ARRHENIUS PLOT; DICHLOROSILANE; REACTION MECHANISMS;

EPITAXIAL GROWTH;

EID: 0028447972     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(94)90513-4     Document Type: Article

References (65)

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