Space Charge Effects in SIMOX Buried Oxides

IEEE Transactions on Nuclear Science

Volumn 41, Issue 3, 1994, Pages 466-472

  Herve D ^a   Paillet, Ph ^a   Leray, J L ^a  

^a CEA DIF   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; DOSIMETRY; ELECTRIC FIELD EFFECTS; ELECTRIC VARIABLES MEASUREMENT; ELECTRONS; ION IMPLANTATION; MATHEMATICAL MODELS; MOS DEVICES; OXIDES; PARTICLE BEAM INJECTION; QUANTUM THEORY; RADIATION EFFECTS;

BACK CHANNEL TRANSISTORS; BURIED OXIDES; ELECTRON TRAPPING; ETCH BACK EXPERIMENT; SEPARATION BY IMPLANTATION OF OXYGEN; SPACE CHARGE EFFECTS; THERMAL OXIDES;

ELECTRIC SPACE CHARGE;

EID: 0028446647     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.299786     Document Type: Article

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