Silicon Nitride Thin-Film Deposition by LPCVD with In Situ HF Vapor Cleaning and Its Application to Stacked DRAM Capacitor Fabrication

IEEE Transactions on Electron Devices

Volumn 41, Issue 5, 1994, Pages 703-708

  Ino, Masayoshi ^a   Inoue, Nobuhiko ^a   Yoshimaru, Masaki ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; CLEANING; COMPOSITION; DIELECTRIC FILMS; FILM GROWTH; INFRARED SPECTROSCOPY; RANDOM ACCESS STORAGE; RELIABILITY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; STACKED CAPACITORS; VAPOR CLEANING;

THIN FILMS;

EID: 0028424837     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.285020     Document Type: Article

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