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Volumn 141, Issue 4, 1994, Pages 1021-1024

Electrochromic Properties of Tungsten Trioxide Thin Films Prepared by Chemical Vapor Deposition

Author keywords

absorption coefficients; chemical reactions; electrochemistry; light transmission; solid structure; surface chemistry; thin films; ultraviolet spectra; visible spectra

Indexed keywords

AMORPHOUS FILMS; CARBONATES; CHEMICAL VAPOR DEPOSITION; COULOMETERS; ELECTROCHROMISM; FILM PREPARATION; LIGHT ABSORPTION; MICROSTRUCTURE; OXIDATION; REDUCTION; TUNGSTEN COMPOUNDS; X RAY ANALYSIS;

EID: 0028416664     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2054834     Document Type: Article
Times cited : (59)

References (8)
  • 2
    • 84975397202 scopus 로고
    • IEEE, New York
    • H. N. Hersh, Electro 76, p. 7, IEEE, New York (1976).
    • (1976) Electro , vol.76 , pp. 7
    • Hersh, H.N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.