Selective etching of c-BN layers

Diamond and Related Materials

Volumn 3, Issue 4-6, 1994, Pages 650-653

  Szmidt, J ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; ETCHING; MICROELECTRONICS; SILICA; SILICON; SUBSTRATES; SYNTHETIC DIAMONDS;

LAYER STRUCTURE; LIFT OFF TECHNIQUE; SELECTIVE ETCHING; WET CHEMICAL ETCHING;

CUBIC BORON NITRIDE;

EID: 0028413161     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(94)90242-9     Document Type: Article

References (10)

1. Crystallization from a reactive pulse plasma
2. Properties and growth of β-BN (borazon) layers from a pulsed plasma under reduced pressure