Optimum electrode materials for t a 2 o 5 capacitors for high- and low-temperature processes

Japanese Journal of Applied Physics

Volumn 33, Issue 3R, 1994, Pages 1293-1297

  Matsuhashi, Hideaki ^a   Nishikawa, Satoshi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIELECTRIC FILMS; ELECTRODES; LEAKAGE CURRENTS; MASS SPECTROMETRY; MOLYBDENUM; MOLYBDENUM COMPOUNDS; NITRIDES; TANTALUM COMPOUNDS; THERMAL EFFECTS; TITANIUM COMPOUNDS;

MOLYBDENUM NITRIDE; SECONDARY ION MASS SPECTROMETRY (SIMS); TANTALUM OXIDE; TITANIUM NITRIDE; WORK FUNCTION;

CAPACITORS;

EID: 0028403985     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.1293     Document Type: Article

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