Absolute measurement of normalized thickness, t/λi, from off-axis electron holography

Ultramicroscopy

Volumn 53, Issue 3, 1994, Pages 283-289

  McCartney, M R ^a   Gajdardziska Josifovska, M ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRON BEAMS; ELECTRON MICROSCOPES; ELECTRON SCATTERING; HIGH ENERGY PHYSICS; HOLOGRAMS; IMAGE RECONSTRUCTION; MAGNESIA; OPTICAL RESOLVING POWER; SILICON; THICKNESS MEASUREMENT;

OFF AXIS ELECTRON HOLOGRAPHY;

HOLOGRAPHY;

ARTICLE; HOLOGRAPHY; MEASUREMENT; THICKNESS;

EID: 0028399154     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-3991(94)90040-X     Document Type: Article

References (12)

1. Electron Microscopy
2. Fresnelscher Interferenzversuch mit einem Biprisma f�r Elektronenwellen