Random stacking in MoS2-x sputtered thin films

Thin Solid Films

Volumn 240, Issue 1-2, 1994, Pages 56-59

  Moser, J ^a   Levy F ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; MATHEMATICAL MODELS; SOLID LUBRICANTS; SPUTTER DEPOSITION; SULFUR COMPOUNDS; THIN FILMS; X RAY ANALYSIS;

MOLYBDENUM DISULFIDE; RANDOM LAYER MODEL; RANDOM STACKING; WILSON'S MODEL; X RAY DIFFRACTOMETRY;

MOLYBDENUM COMPOUNDS;

EID: 0028397567     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)90693-9     Document Type: Article

References (16)

1. X-ray diffraction by random layers: ideal line profiles and determination of sructure amplitudes from observed line profiles
2. Proc. 10th Int. Conf. on Vacuum Metallurgy Proc.