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Volumn 41, Issue 2, 1994, Pages 198-203

Influence of emitter-base junction design on collector saturation current, ideality factor, early voltage, and device switching speed of Si/SiGe HBT's

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRIC NETWORK PARAMETERS; GATES (TRANSISTOR); HETEROJUNCTIONS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING;

EID: 0028378745     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.277379     Document Type: Article
Times cited : (33)

References (13)
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    • The effects of base dopant outdiffusion and undoped SiGe junction spacer layers in Si/SiGe HBT's
    • E. J. Prinz P. M. Garone P. V. Schwartz X. Xiao J. C. Sturm The effects of base dopant outdiffusion and undoped SiGe junction spacer layers in Si/SiGe HBT's Electron Device Lett. 12 42 1991
    • (1991) Electron Device Lett. , vol.12 , pp. 42
    • Prinz, E.J.1    Garone, P.M.2    Schwartz, P.V.3    Xiao, X.4    Sturm, J.C.5
  • 3
    • 85143023661 scopus 로고    scopus 로고
    • Analytical modeling of current gain-Early voltage products in Si/SiGe/Si HBTs
    • E. J. Prinz J. C. Sturm Analytical modeling of current gain-Early voltage products in Si/SiGe/Si HBTs IEDM 91 853 IEDM 91
    • Prinz, E.J.1    Sturm, J.C.2
  • 6
    • 0026170817 scopus 로고
    • Graded-base Si/SiGe/Si HBT's grown by RTCVD with near ideal electrical characteristics
    • J. C. Sturm E. J. Prinz C. W. Magee Graded-base Si/SiGe/Si HBT's grown by RTCVD with near ideal electrical characteristics Electron Device Lett. 12 303 1991
    • (1991) Electron Device Lett. , vol.12 , pp. 303
    • Sturm, J.C.1    Prinz, E.J.2    Magee, C.W.3
  • 7
    • 0004176147 scopus 로고
    • Bipolar Semiconductor Devices
    • McGraw-Hill New York
    • D. J. Roulston Bipolar Semiconductor Devices 1990 McGraw-Hill New York
    • (1990)
    • Roulston, D.J.1
  • 8
    • 0022664894 scopus 로고
    • Band alignments of coherently strained GeSi/Si heterostructures
    • R. People J. C. Bean Band alignments of coherently strained GeSi/Si heterostructures APL 48 538 1986
    • (1986) APL , vol.48 , pp. 538
    • People, R.1    Bean, J.C.2
  • 9
    • 36549090596 scopus 로고
    • Ion beam enhanced diffusion of Β during Si MBE
    • P. R. Pukite S. S. Iyer G. J. Scilla Ion beam enhanced diffusion of Β during Si MBE APL 54 10 916 1989
    • (1989) APL , vol.54 , Issue.10 , pp. 916
    • Pukite, P.R.1    Iyer, S.S.2    Scilla, G.J.3
  • 10
    • 0001188437 scopus 로고
    • Experimental study of diffusion and segregation in a SiGeSi heterostructure
    • S. M. Hu Experimental study of diffusion and segregation in a SiGeSi heterostructure Phys. Rev. Lett. 67 1450 1991
    • (1991) Phys. Rev. Lett. , vol.67 , pp. 1450
    • Hu, S.M.1
  • 12
    • 0026926424 scopus 로고
    • The influence of MBE-layer design on the high frequency performance of Si/SiGe HBTs
    • A. Gruhle H. Kibbel E. Kasper The influence of MBE-layer design on the high frequency performance of Si/SiGe HBTs Microelectr. Εng 19 435 1992
    • (1992) Microelectr. Εng , vol.19 , pp. 435
    • Gruhle, A.1    Kibbel, H.2    Kasper, E.3
  • 13
    • 85143029839 scopus 로고
    • Base thickness and high frequency performance of SiGe HBTs
    • A. Gruhle H. Kibbel U. Erben E. Kasper Base thickness and high frequency performance of SiGe HBTs Ρroc. Dev. Res. Conf. IIA-2 Ρroc. Dev. Res. Conf. 1993
    • (1993) , pp. IIA-2
    • Gruhle, A.1    Kibbel, H.2    Erben, U.3    Kasper, E.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.