Step coverage, uniformity and composition studies using integrated vapour transport and film-deposition models

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 33, Issue 2, 1994, Pages 1140-1145

  Dew, Steven ^a   Smy, Tom ^a   Brett, Michael ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; COMPOSITION EFFECTS; FILM GROWTH; INTEGRATED CIRCUIT MANUFACTURE; MAGNETRONS; MATHEMATICAL MODELS; METALLIC FILMS; METALLIZING; MICROSTRUCTURE; MONTE CARLO METHODS; THICKNESS CONTROL;

COMPOSITIONAL VARIATIONS; INTEGRATED VAPOUR TRANSPORT MODEL; STEP COVERAGE; UNIFORMITY;

SPUTTER DEPOSITION;

EID: 0028375735     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.33.1140     Document Type: Article

References (24)