Production of fullerenes by low temperature plasma chemical vaper deposition under atmospheric pressure

Japanese Journal of Applied Physics

Volumn 33, Issue 2A, 1994, Pages L197-L199

  Inomata, Kiyoto ^a   Aoki, Nobuyuki ^b   Koinuma, Hideomi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKAI UNIVERSITY   (Japan)

Author keywords

Atmospheric pressure; Low temperature; Organo compounds as source material; Plasma CVD; Production of fullerenes

Indexed keywords

AROMATIC HYDROCARBONS; ATMOSPHERIC PRESSURE; BENZENE; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; SOLUTIONS; SOOT; ULTRAVIOLET SPECTROSCOPY;

FULLERENES; PLASMA CHEMICAL VAPOR DEPOSITION;

CARBON;

EID: 0028374458     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.L197     Document Type: Article

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