The Integration of Simulation and Response Surface Methodology for the Optimization of IC Processes

IEEE Transactions on Semiconductor Manufacturing

Volumn 7, Issue 1, 1994, Pages 22-33

  Walton, Anthony J ^b  

^a Plessey Semiconductors   (United Kingdom)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATION; COMPUTER AIDED ANALYSIS; COMPUTER AIDED DESIGN; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; COMPUTER SOFTWARE; GRAPHIC METHODS; INTERFACES (COMPUTER); MOS DEVICES; OPTIMIZATION; SENSITIVITY ANALYSIS; TRANSFER FUNCTIONS;

PROCESS OPTIMIZATION; RESPONSE SURFACE METHODOLOGY; SEMICONDUCTOR PROCESSES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0028370274     PISSN: 08946507     EISSN: 15582345     Source Type: Journal    
DOI: 10.1109/66.286830     Document Type: Article

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