High Temperature Oxidation of Ion-Plated CrN Films

Journal of Materials Research

Volumn 9, Issue 1, 1994, Pages 151-155

  Ichimura, Hiroshi ^a   Kawana, Atsuo ^a  

^a SUMITOMO METAL MINING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; FILMS; HIGH TEMPERATURE EFFECTS; NITRIDES; OXIDATION; OXIDES; PLATING; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; SUBSTRATES; X RAY ANALYSIS;

ARC ION PLATING; CHROMIUM NITRIDE FILMS;

CHROMIUM COMPOUNDS;

EID: 0028338157     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1994.0151     Document Type: Article

References (10)

1. W. D. Münz, J. Vac. Sci. Technol. A 4, 2717 (1986).
2. H. Freller and H. Haessler, Thin Solid Films 153, 433 (1987).
3. H. Ichimura and A. Kawana, J. Mater. Res. 8, 1093 (1993).
4. Y. Chiba, T. Omura, and H. Ichimura, J. Mater. Res. 8, 1109 (1993).
5. A. Kawana and H. Ichimura, Shigen Sozai Gakkai-shi (in Japanese) 108, 868 (1992).
6. B. Navinsek and P. Panjan, Thin Solid Films 223, 4 (1993).
7. P. Kofstad and K. Lillerude, J. Electrochem. Soc. 127, 73 (1980).
8. W. Jander, Z. Anorg. Chem. 163, 1 (1927).
9. W. C. Hagel and A. U. Seybolt, J. Electrochem. Soc. 108, 1146 (1961).
10. R. Lindner and A. Akeratrom, Z. Phys. Chem. (Frankfurt), N.F. 6, 162 (1956).