Structural properties of titanium dioxide films grown on p-Si by metal-organic chemical vapor deposition at low temperature

Thin Solid Films

Volumn 238, Issue 1, 1994, Pages 12-14

  Yoon, Y S ^a   Kang, W N ^a   Yom, S S ^a   Kim, T W ^b   Jung, M ^b   Park, T H ^b   Seo, K Y ^b   Jong Yong Lee, ^c  

^a Korea Institute of Science and Technology   (South Korea)

^b Kwangwoon University   (South Korea)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; INTERFACES (MATERIALS); LOW TEMPERATURE OPERATIONS; MICROSCOPIC EXAMINATION; STRUCTURE (COMPOSITION); TITANIUM DIOXIDE; X RAY ANALYSIS;

METAL ORGANIC CHEMICAL VAPOR DEPOSITION; STRUCTURAL PROPERTIES; TITANIUM DIOXIDE EPITAXIAL FILMS;

THIN FILMS;

EID: 0028320098     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)90640-8     Document Type: Article

References (21)

1. Optical properties of electron-beam evaporated TiO2 films deposited in an ionized oxygen medium
2. Ion-assisted deposition effects on the surface structure of a TiO2 thin film
3. TiO2 film oxygen sensors made by chemical vapour deposition from organometallics
4. Optimizing deposition parameters of electron beam evaporated TiO_2 films
5. Gas-Phase Nucleation in GaAs Thin Film Preparation by Metal Organic Chemical Vapor Deposition