Three-dimensional structurization by additive lithography, analysis of deposits using TEM and EDX, and application to field-emitter tips

Microelectronic Engineering

Volumn 23, Issue 1-4, 1994, Pages 477-481

  Kretz, J ^a   Rudolph, M ^a   Weber, M ^a   Koops, H W P ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b Forschungszentrum der Telekom ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; GOLD; GROWTH (MATERIALS); INTERFACES (MATERIALS); STRUCTURE (COMPOSITION); SUBSTRATES; THREE DIMENSIONAL; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

DIMETHYL-GOLD-TRIFLUORO-ACETYLACETONATE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0028317459     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(94)90199-6     Document Type: Article

References (18)

1. Constructive three-dimensional lithography with electron-beam induced deposition for quantum effect devices
2. Proc. STM'93
3. Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope