Low energy ion implantation / deposition as a film synthesis and bonding tool

Materials Research Society Symposium Proceedings

Volumn 316, Issue , 1994, Pages 833-844

  Anders, Andre ^a   Anders, Simone ^a   Brown, Ian G ^a   Ivanov, Igor C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; FILM GROWTH; INTERFACES (MATERIALS); ION BEAMS; PHASE TRANSITIONS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; SUBSTRATES; SURFACES; SYNTHESIS (CHEMICAL); THIN FILMS;

ATOMIC MIXING; BONDING TOOL; CATHODIC ARC METAL PLASMA; FILM SYNTHESIS; ION BOMBARDMENT; LOW ENERGY ION IMPLANTATION; PLASMA DEPOSITION; PLASMA GENERATORS; PLASMA PHYSICS; PULSE BIASING;

ION IMPLANTATION;

EID: 0028274514     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (58)