Fluorine-enhanced Si:Er light emission

Materials Research Society Symposium Proceedings

Volumn 316, Issue , 1994, Pages 493-498

  Ren, F Y G ^a   Michel, J ^a   Jacobson, D C ^a   Poate, J M ^a   Kimerling, L C ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; COMPLEXATION; DIFFUSION; DISSOCIATION; DOPING (ADDITIVES); ERBIUM; FLUORINE; ION IMPLANTATION; LUMINESCENCE; SILICON; THERMAL EFFECTS;

ANNEALING TEMPERATURE; COMPLEX FORMATION; DAMAGE RECOVERY; ERBIUM-FLUORINE COMPLEX; LUMINESCENCE LIGHT INTENSITY; OPTIMUM PROCESSING WINDOW;

LIGHT EMISSION;

EID: 0028274511     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)