Quantitative evaluation of gate oxide damage during plasma processing using antenna-structure capacitors

Japanese Journal of Applied Physics

Volumn 33, Issue 1R, 1994, Pages 83-

  Eriguchi, Koji ^a   Uraoka, Yukiharu ^a   Nakagawa, Hideo ^a   Tamaki, Tokuhiko ^a   Kubota, Masafumi ^a   Nomura, Noboru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ETCHING; PLASMA SPRAYING; SEMICONDUCTOR MATERIALS;

ANTENNA EFFECT; CHARGE BUILD-UP; DRY ETCHING; GATE OXIDE DAMAGE; PLASMA PROCESSING;

MOS DEVICES;

EID: 0028207697     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.83     Document Type: Article

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