Preparation of ZnO films by reactive evaporation

Thin Solid Films

Volumn 237, Issue 1-2, 1994, Pages 16-18

  Jin, Ma ^a   Shu Ying, Li ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; ENERGY GAP; EVAPORATION; FILM PREPARATION; FILMS; LIGHT ABSORPTION; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; OXYGEN;

ELECTRON CARRIER DENSITY; HALL MOBILITY; OPTICAL ABSORPTION MEASUREMENT; REACTIVE EVAPORATION; STRUCTURAL PROPERTIES; ZINC CHLORIDE;

ZINC OXIDE;

EID: 0028199325     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)90230-5     Document Type: Article

References (12)

1. Optical properties of nonstoichiometric zinc oxide films deposited by bias sputtering
2. The Influence of Ambient Oxygen on the Electronic Conductivity of ZnO Thin Films
3. Optical properties of spray deposited ZnO films
4. Optical and electrical properties of ZnO films prepared by spray pyrolysis for solar cell applications