(Electro-) Mechanical Characteristics of Electrostatically Driven Vacuum Encapsulated Polysilicon Resonators

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 41, Issue 1, 1994, Pages 4-6

  Tilmans, H A C ^a   Legtenberg, R ^a   Schurer, H ^a   Ijntema, D J ^a   Elwenspoek, M ^a   Fluitman, J H J ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CIRCUIT OSCILLATIONS; ELECTROSTATICS; EQUIVALENT CIRCUITS; ION IMPLANTATION; MICROMACHINING; PLASMA APPLICATIONS; RESONANT CIRCUITS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SIGNAL TO NOISE RATIO; SILICON NITRIDE;

BORON IMPLANTATION; GAUGE FACTOR; QUALITY FACTOR; SURFACE MICROMACHINING; VACUUM ENCAPSULATED POLYSILICON RESONATORS;

CAVITY RESONATORS;

EID: 0028194761     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/58.265813     Document Type: Article

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