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85046065443
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note
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2 (caution: this solution reacts violently with organic materials) and were thoroughly rinsed with purified water.
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0025445393
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The survey spectrum was obtained on a Scienta (Uppsala, Sweden) ESCA-300 spectrometer with Al Kα radiation. In addition to the element named, this spectrum revealed a trace amount of oxidized sulfur on the sample (S 2s, 232.0 eV), most likely a result of the cleaning procedure used [W. Kern, J. Electrochem. Soc. 137, 1887 (1990)].
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Kern, W.1
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85046064192
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note
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All data in Fig. 1 are averages over three points on each of two samples treated side-by-side, with the exception of the point at 60 cycles, which is an average over five points on one sample. Similar thicknesses were seen on other samples. More extensive rinsing during the preparation led to adsorption of slightly less material per cycle (by ∼2 Å). The refractive index assumed, 1.5, was representative of the values measured ellipsometrically (1.48 to 1.59) on structures greater than 50 nm in thickness. The measured refractive index increased with increasing multilayer thickness.
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85046063019
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note
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The concentration of the polymer solution was diluted in increments from 20 to 0.05% (w/w), and in response, the amount of polymer adsorbed per cycle decreased monotonically from 2.1 to 0.1 nm. The amount of hectorite adsorbed per cycle correspondingly fell monotonically from 2.7 to 0.6 nm.
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85046061858
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note
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3Cl onto a silicon wafer from a chloroform solution gave a covalently bound layer with an ellipsometric thickness of ∼6 Å.
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0008075208
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March
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G. Decher et al., Polym. Prepr. 34, 745 (March 1993); Y. Lvov, H. Haas, G. Decher, H. Möhwald, A. Kalachev, J. Phys. Chem. 97, 12835 (1993); R. K. Iler, J. Colloid Interface Sci. 21, 569 (1966).
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Decher, G.1
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G. Decher et al., Polym. Prepr. 34, 745 (March 1993); Y. Lvov, H. Haas, G. Decher, H. Möhwald, A. Kalachev, J. Phys. Chem. 97, 12835 (1993); R. K. Iler, J. Colloid Interface Sci. 21, 569 (1966).
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85046061722
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note
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Data were obtained on a Philips APD 3720 powder x-ray diffractometer with Cu Kα radiation.
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28
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85046061963
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note
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2 in area). A measured increase in thickness of 3.6 nm may indicate that in any one cycle, some regions within the illuminated spot gained two layers, while others gained three.
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29
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0003438364
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Wright, Bristol, UK
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H. S. Peiser et al., Eds., X-Ray Diffraction by Polycrystalline Materials (Wright, Bristol, UK, 1955), p. 466.
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Warren, B.E.1
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85046064612
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note
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The XRD data presented in the original manuscript of this report had two additional features: a very sharp peak at 33.0° (d = 0.27 nm), and a broad, very low intensity peak at ∼13.3° (d = 0.66 nm). Both of these features were absent if samples were rinsed more extensively both during multilayer formation and shortly before XRD analysis. The full width at half height of the (001) peak in that pattern was 2.0°, indicating a domain size of 3.6 nm.
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34
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85046062481
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The AFM image was acquired with a Parks Scientific Instruments Autoprobe cp with an Ultralever (silicon) probe tip.
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35
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85046064306
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note
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We have recently formed PDDA-hectorite multilayers on gold and on copper and have formed multilayered structures on silicon using a different polyelectrolyte, poly(N-methyl-4-vinylpyridinium bromide).
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47
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85046065675
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note
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We gratefully acknowledge O. Shaffer for assistance in obtaining AFM images, D. Simpson for helpful discussions regarding the interpretation of x-ray diffractograms (obtained with the assistance of G. Yasko), A. Miller and D. Carey for technical assistance with the x-ray photoemission spectroscopic analysis, and Lehigh University for supporting the Scienta ESCA-300 Laboratory. Silicon wafers used as substrates were donated by WaferNet. The synthetic hectorite was donated by Laporte Industries to D. Hseih, who kindly provided us with a sample. E.R.K. gratefully acknowledges financial support from AT&T Bell Laboratories in the form of a Ph.D. Scholarship.
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