Materials analysis of fluorocarbon films for MEMS applications

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1994, Pages 170-175

  Elders, J ^a   Jansen, H V ^a   Elwenspoek, M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; CHEMICAL RESISTANCE; COMPOSITION; FLUOROCARBONS; INFRARED SPECTROSCOPY; NITROGEN; PLASMA APPLICATIONS; POLYTETRAFLUOROETHYLENES; REFRACTIVE INDEX; SULFUR COMPOUNDS; X RAY ANALYSIS; X RAY SPECTROSCOPY;

CARBON HYDROTRIFLUORIDE PLASMA; ELECTRON BEAM EVAPORATION; ENERGY DISPERSIVE X RAY ANALYSIS; FLUOROCARBON FILMS; PLASMA DEPOSITION; REACTIVE ION ETCHER; SPIN COATING; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 0028112830     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)