III-V on Si: heteroepitaxy versus lift-off techniques

Journal of Crystal Growth

Volumn 127, Issue 1-4, 1993, Pages 85-92

  De Boeck, J ^a   Borghs, G ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR BEAM EPITAXY; PERFORMANCE; SEMICONDUCTING SILICON; SEMICONDUCTOR MATERIALS; SUBSTRATES; THIN FILMS;

HETEROEPITAXY; LIFT-OFF TECHNIQUES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0027904542     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(93)90583-I     Document Type: Article

References (66)

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