Simulation Of Az-Pn100 Resist Pattern Fluctuation In X-Ray Lithography, Including Synchrotron Beam Polarization

Japanese Journal of Applied Physics

Volumn 32, Issue 12 S, 1993, Pages 5951-5959

  Scheckler, Edward W ^a   Ogawa, Taro ^a   Tanaka, Toshihiko ^a   Oizumi, Hiroaki ^b   Takeda, Eiji ^a  

^a HITACHI LTD   (Japan)

^b SORTEC Corporation   (Japan)

Author keywords

Chemical amplification resist; Process simulation; X ray lithography

Indexed keywords

CHEMICAL MODIFICATION; ELECTROMAGNETIC WAVE POLARIZATION; ELECTRON SCATTERING; INFRARED SPECTROSCOPY; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; MONTE CARLO METHODS; PHOTORESISTS; POLYMERS; SURFACE PROPERTIES; SYNCHROTRON RADIATION; ULSI CIRCUITS;

ACID CATALYST RANDOM WALK MODEL; BEAM POLARIZATION EFFECT; CHEMICAL AMPLIFICATION RESIST; POST EXPOSURE BAKE; PROCESS SIMULATION; RESIST PATTERN FLUCTUATION;

X RAY LITHOGRAPHY;

EID: 0027891662     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.5951     Document Type: Article

References (37)

1. F. Cerrina: Jpn. J. Appl. Phys. 31 (1992) 4178.
2. F. Rousseaux, A. M. Haghiri-Gosnet, Y. Chen, M. F. Ravet and H. Launois: Jpn. J. Appl. Phys. 31 (1992) 4520.
3. E. Spiller: X-Ray Optics (Springer, New York, 1977).
4. E. W. Scheckler, S. Shukuri and E. Takeda: Jpn. J. Appl. Phys. 32 (1993) 327.
5. K. Early, D. M. Tennant, D. Y. Jeon, P. P. Mulgrew, A. A. MacDowell and O. R. Wood II: J. Vac. Sci. k Technol. B 10 (1992) 2600.
6. E. W. Scheckler, T. Ogawa, T. Yoshimura, S. Shukuri and E. Takeda: 1993 Symposium on VLSI Technology, Dig. Tech. Pap., Kyoto, Japan (Business Center for Academic Societies Japan, Tokyo, 1993) p. 56-57.
7. T. Yoshimura, H. Shiraishi, J. Yamamoto and S. Okazaki: to be published in Appl. Phys. Lett.
8. A. R. Neureuther: J. Vac. Sci. k Technol. 15 (1978) 1004.
9. H. Betz, K. Heinrich, A. Heuberger, H. Huber and H. Oertel: J. Vac. Sci. k Technol. B 4 (1986) 248.
10. H. Oertel, M. Weiss, J. Chlebek, H. L. Huber, R. Dammel, C. R. Lindley, J. Linguau and J. Theis: Proc. SPIE 1089 (1989) 283.
11. S. Turner, C. Babcock and F. Cerrina: J. Vac. Sci. k Technol. B 9 (1991) 3440.
12. K. Murata: J. Appl. Phys. 57 (1985) 575.
13. K. Murata, M. Kotera, K. Nagamiand S. Namba: IEEE Trans. Electron Devices ED-32 (1985) 1694.
14. E. W. Scheckler, T. Ogawa, S. Shukuri and E. Takeda: 1993 International Workshop on VLSI Process and Device Modeling, Nara, Japan (Business Center for Academic Societies Japan, Tokyo, 1993) p. 149-150.
15. J. Nishino, M. Kawakami, T. Yanasigawa and K. Okada: J. Vac. Sci. k Technol. B 8 (1990) 1514.
16. D. L. Spears and H. I. Smith: Electron. Lett. 8 (1972) 102.
17. J. J. Yeh and I. Lindau: Atomic Data and Nuclear Tables, vol. 32, 1985.
18. J. Cooper and R. N. Zare: J. Chem. Phys. 48 (1968) 942, 4252.
19. A. Jablonski: Surf. Sci. 188 (1987) 164.
20. K. Y. Lee, G.-S. Cho and D. I. Choi: J. Appl. Phys. 67 (1990) 7560.
21. T. Ogawa: Jpn. J. Appl. Phys. 28 (1989) 2070.
22. M. Morigami, T. Tanaka and I. Higashikawa: Proc. 42nd Symp. on Semiconductors and Integrated Circuits Technology (The Electrochemical Society of Japan, Tokyo, 1992) [in Japanese].
23. J. Grimm, J. Chlebek, T. Schulz and H.-L. Huber: J. Vac. Sci. k Technol. B 9 (1991) 3392.
24. K. Early, D. M. Tennant, D. Y. Jeon, P. P. Mulgrew, A. A. MacDowell and O. R. Wood II: J. Vac. Sci. k Technol. B 10 (1992) 2600.
25. T. H. Fedynyshyn, M. F. Cronin and C. R. Szmanda: J. Vac. Sci. k Technol. B 9 (1991) 3380.
26. R. A. Ferguson: Ph. D. Dissertation, University of California, Berkeley, Electronics Research Laboratory Memo. M91/78, Sep. 17, 1991.
27. R. A. Ferguson, J. M. Hutchison, C. A. Spence and A. R. Neureuther: J. Vac. Sci. k Technol. B 8 (1990) 1423.
28. N. N. Tam: Ph.D. Dissertation, University of California, Berkeley, Electronics Research Laboratory Memo. M91/102, Nov. 19, 1991.
29. H. Fukuda and S. Okazaki: Jpn. J. Appl. Phys. 28 (1989) 2104.
30. H.-Y. Liu, M. P. DeGrandpre and W. E. Feely: J. Vac. Sci. k Technol. B 6 (1988) 379.
31. H. Shiraishi, N. Hayashi, T. Ueno, O. Suga, F. Murai and S. Nongaki: Polymers for High Technology (American Chemical Society Symposium Series, 1987) p. 77-85.
32. H. Shiraishi, E. Fukuma, N. Hayashi, K. Tadano and T. Ueno: Chem. Mater. 3 (1991) 621.
33. D. Chandler: Introduction to Modern Statistical Mechanics (Oxford University Press, 1987) p. 250.
34. H. Toshino and H. Matsumoto: Jpn. J. Appl. Phys. 31 (1992) 4283.
35. J. Nakamura, H. Ban and A. Tanaka: Jpn. J. Appl. Phys. 31 (1992) 4294.
36. T. Ogawa, H. Oizumi, T. Soga and K. Mochiji: Ext. Abstr. 52nd Autumn Meeting 1991 of Japan Society of Applied Physics (1991) p. 518.
37. F. Cerrina: personal communication.