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Volumn 32, Issue 4, 1993, Pages 423-434
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Photosensitive polymers containing pendent chalcone moieties via oxyethylene group
a
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Author keywords
photochemical reactivities of photosensitive polymers; Photosensitive monomers and polymers; polymeric chalcone derivatives; reactive polymers; vinyl chalcone monomers
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Indexed keywords
COPOLYMERS;
DERIVATIVES;
FREE RADICAL POLYMERIZATION;
LIGHT SENSITIVE MATERIALS;
MOLECULAR STRUCTURE;
MONOMERS;
PHOTOCHEMICAL REACTIONS;
RADIATION EFFECTS;
SYNTHESIS (CHEMICAL);
ULTRAVIOLET RADIATION;
POLYMERIC CHALCONE DERIVATIVES;
REACTIVE POLYMERS;
VINYL CHALCONE MONOMERS;
ORGANIC POLYMERS;
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EID: 0027881386
PISSN: 09598103
EISSN: 10970126
Source Type: Journal
DOI: 10.1002/pi.4990320415 Document Type: Article |
Times cited : (22)
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References (16)
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